Do you want faster stock removal and better flatness when polishing your materials?

Spartan’s Surface Preparation Division is pleased to introduce the SPS-1 Polishing Pad.

Our new Spartan Planar Supreme is a unique, cast microcellular polymeric material specifically designed and manufactured to provide superior stock removal, flatness and surface finish variety of materials. It is best suited for CMP of electronic and advanced materials, virgin silicon and oxide/metal depositions (delayering & planarization). Compound semiconductor electro-optic/IR substrates can be easily polished when used in combination with appropriate slurries. The proprietary composition of the bulk matrix is a balance of components and additives that form the correct density/structure to supplement the nature of the polishing solution being employed. The SPS-1 is also available with a grooved channel configuration improve slurry flow and reduce piece-part suction. This is truly and applications-specific pad.

We also manufacture Diamond Coated Pads for grind/lap operations when fast bulk material removal is needed. Alternatively, Spartan Impregnated Pads with aluminum oxide, silicon carbide, diamond or boron carbide fillers can be used for roughing steps. Sub-micron up micron grains are evenly distributed into a non-woven, chemically treated substrate to from dense, durable pad. They are available with PSA, magnetic or hook & loop backing.